Composition and method for creating nanoscale surface geometry on an implantable device
AssigneeTech Met, Inc.
InventorsMichael Vidra, Edward Palanko, Robert Vaccaro, Jordan Incerpi
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AssigneeTech Met, Inc.
InventorsMichael Vidra, Edward Palanko, Robert Vaccaro, Jordan Incerpi
Estimating the term…
Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.
An alkaline composition for etching a nanoscale surface geometry on at least a portion of a metal surface of a body implantable device, the composition consisting of:
An alkaline composition for etching a nanoscale surface geometry on at least a portion of a metal surface of a body implantable device, the composition comprising:
An aqueous alkaline composition for etching a nano scale surface geometry on at least a portion of an aluminum surface, the composition comprising:
Dependencies are inferred from the claim text.