Substrate treatment apparatus

A substrate treatment apparatus comprising:

• a chuck base rotating together with a substrate in a state of supporting the substrate thereagainst;
• a fluid supply unit for supplying treatment liquid to the substrate;
• a bowl assembly having a plurality of bowls that overlap outward in a radial direction with respect to the center of the substrate in such a way as to surround the chuck base;
• an ascending and descending unit for moving the bowl assembly up and down;
• and
• a shutter unit disposed on top of an outermost bowl of the bowl assembly to adjust a radius of an air flow inlet through which air flow passes toward the substrate,
• wherein the shutter unit comprises:
• a housing frame disposed on top of the outermost bowl;
• a shutter member disposed between the top of the outermost bowl and the housing frame to adjust the radius of the air flow inlet;
• and
• shutter driving member connected to the shutter member to apply forces to the shutter member so that the radius of the air flow inlet is adjusted,
• wherein the shutter member comprises:
• the plurality of shutter blades equally spaced apart from one another in the circumferential direction of the top of the outermost bowl in such a way as to be hingeable around hinge points formed on the top of the outermost bowl;
• and
• a blade moving ring-shaped part whose one side is connected to the shutter driving member and the other side is connected relatively rotatable to the shutter blades, and the blade moving ring-shaped part having a through hole penetrating into the center thereof and being installed so as to be rotatable about the rotational axis of the substrate relative to the top of the outermost bowl.