Pattern forming apparatus
AssigneesHanbat National University Industry-Academic Cooperation Foundation, Tokyo Institute of Technology
InventorsJoon-wan Kim, Dong Soo Kim, Min Hun Jung, Hyun Ah Lee
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Abstract
Provided is a pattern forming apparatus which may form a pattern on a substrate with high precision by using a material including an organic material, the pattern forming apparatus including: a capillary facing a grounded substrate and capable of storing a solution including a sample; a power source applying a voltage to the capillary; a stencil mask disposed between the capillary and the substrate, and including an opening through which the sample passes; and a cross-direction actuator moving the stencil mask in a cross direction crossing a direction in which the sample passes.
Claims6
A pattern forming apparatus comprising:
- a capillary facing a substrate configured to be grounded and configured to store a solution including a sample;
- a power source configured to apply a voltage to the capillary;
- a stencil mask disposed between the capillary and the substrate, and including an opening through which the sample passes;
- and
- a cross-direction actuator configured to move the stencil mask in a cross direction crossing a direction in which the sample passes, wherein:
- the stencil mask is formed from a plurality of laminated layers,
- each of the plurality of laminated layers has an elongated hole, and the elongated holes overlap to form a slit having a stepped cross section that gradually narrows from an uppermost layer to a lowermost layer, and
- a voltage is applied to a conductor of each of the plurality of laminated layers, wherein the voltage gradually decreases from the uppermost layer to the lowermost layer, thereby forming an electric force line that is bent, such that particles entering the slit are collected along the electric force line and deposited on the substrate to form a deposit having a width smaller than a size of the slit.
Dependencies are inferred from the claim text.