Detection chip and modification method therefor

A modification method of a detection chip, comprising:

• forming a polydopamine film on a surface of a hydrophilic layer by adopting a dopamine-containing buffer solution to perform surface film-forming treatment on the hydrophilic layer on a first substrate constituting the detection chip, wherein the hydrophilic layer covers sample application platforms located on the first substrate;
• and
• forming a carboxyl-containing modification group on a surface of the hydrophilic layer by adopting a buffer solution containing sodium hyaluronate to perform a surface carboxylation treatment on the hydrophilic layer with the polydopamine film;
• wherein before the performing the surface film-forming treatment on the hydrophilic layer on the first substrate constituting the detection chip, the modification method further comprises:
• forming the hydroxyl-containing modification group on the surface of the hydrophilic layer by putting the first substrate with the hydrophilic layer into a piranha solution, to be soaked under a temperature condition of 70° C.-90° C. for 12 h-24 h, wherein the piranha solution comprises concentrated sulfuric acid and 30% hydrogen peroxide, and a volume ratio of the concentrated sulfuric acid to the 30% hydrogen peroxide is 1:3;
• wherein before the forming hydroxyl-containing modification group on the hydrophilic layer on the first substrate, the modification method further comprises:
• ultrasonic-cleaning the first substrate with the hydrophilic layer by sequentially adopting acetone, ethyl alcohol and deionized water as a solution, and blow-drying ultrasonic-cleaned first substrate for standby application;
• wherein before the ultrasonic-cleaning the first substrate with the hydrophilic layer, the modification method further comprises:
• forming the plurality of sample application platforms on the first substrate;
• and
• respectively forming the hydrophilic layer on the sample application platforms, comprising:
• depositing a silicon oxide layer on a layer where the sample application platforms are located;
• and obtaining the hydrophilic layer by etching the silicon oxide layer, and reserving a silicon oxide layer covering a region where all the sample application platforms are located to.