Formation of monolithic nanostructures on prosthetic devices
AssigneeDanmarks Tekniske Universitet
InventorsYiyu Ou, Paul Michael Petersen
Life of this patent
Estimating the term…
Abstract
A method for formation of monolithic nanostructures on an implantable device includes: a. depositing a metal film to a surface of the implantable device; b. heating the metal film for a period of time, such that the metal film transforms into multiple discrete nanoparticles, the multiple nanoparticles thereby forming an etch mask on the surface of the implantable device; c. etching the implantable device such that the surface of the implantable device is etched through the etch mask, thereby forming monolithic nanostructures in the surface of the implantable device; and d. (optionally) removing the etch mask, such as by immersion in an aqua regia solution.
Claims15
A method for formation of monolithic nanostructures on an implantable device, the monolithic nanostructures being configured for osseointegration and prevention of bacterial growth of the implantable device, the method comprising:
- a. depositing a metal film to a surface of the implantable device;
- b. heating the metal film for a period of time, such that the metal film transforms into multiple discrete nanoparticles, the multiple nanoparticles thereby forming an etch mask on said surface of the implantable device;
- and
- c. etching the implantable device such that said surface of the implantable device is etched through the etch mask, wherein the surface of the implantable device is etched simultaneously as the etch mask is etched, thereby forming monolithic nanostructures on the surface of the implantable device.
A method for formation of monolithic nanostructures on an implantable device, the method comprising:
- a. depositing a metal film to a surface of the implantable device;
- b. heating the metal film for a period of time, such that the metal film transforms into multiple discrete nanoparticles, the multiple nanoparticles thereby forming an etch mask on said surface of the implantable device;
- and
- c. etching the implantable device such that said surface of the implantable device is etched through the etch mask, wherein the surface of the implantable device is etched simultaneously as the etch mask is etched, thereby forming monolithic nanostructures on the surface of the implantable device,
- wherein the nanostructures are substantially cone-shaped, extending from the surface of the implantable device.
Dependencies are inferred from the claim text.