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US 12,588,475 B2Granted
High selectivity doped hardmask films
AssigneeLam Research Corporation
InventorsSonal Bhadauriya, Ragesh Puthenkovilakam, Kapu Sirish Reddy, Seshasayee Varadarajan, Shruti Vivek Thombare
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Abstract
The present disclosure relates to high selectivity doped hardmask films, as well as methods of providing and using such films. In particular examples, the high selectivity doped hardmask film can be employed as a hardmask, an intermediate layer, or a coverage layer.
Claims20
A method for providing a molybdenum-containing layer, the method comprising:
- providing a substrate on a substrate holder in a processing chamber;
- exposing a top surface portion of the substrate to a molybdenum-containing precursor and one or more optional deposition precursors;
- and
- depositing a molybdenum-containing layer on the top surface portion of the substrate in a presence or an absence of a plasma within the processing chamber, wherein the molybdenum-containing layer comprises less than about 2 atomic % fluorine.
1 more element
A method for processing a substrate, the method comprising:
- providing a substrate having a material layer disposed on a top surface portion of the substrate;
- depositing a molybdenum-containing layer on a top surface portion of the material layer, wherein said depositing comprises delivering a molybdenum-containing precursor and one or more optional deposition precursors, and wherein the molybdenum-containing layer comprises less than about 2 atomic % fluorine;
- forming a patterned mask over the molybdenum-containing layer;
- transferring a pattern of the patterned mask to the molybdenum-containing layer, thereby forming a defined pattern within the molybdenum-containing layer;
- and
- transferring the defined pattern to the material layer.
3 more elements
Dependencies are inferred from the claim text.