Composition for forming protective film against alkaline aqueous hydrogen peroxide, substrate for producing semiconductor apparatus, method for forming protective film, and method for forming pattern

A composition for forming a protective film against an alkaline aqueous hydrogen peroxide, the composition comprising:

• (A) a polymer represented by the following any one of (I) and (II) and having a fluorine atom and a hydroxy group, or a mixture of a polymer having a fluorine atom and a polymer having a hydroxy group represented by the following (III);
• (I) a polymer having a repeating unit represented by the following general formula (1A) and having at least one or more fluorine atoms and at least one or more hydroxy groups, a terminal group thereof being a group represented by any one of the following general formulae (1B) and (1C),
• (II) a polymer having a repeating unit represented by the following general formula (2A) and having at least one or more fluorine atoms and a repeating unit represented by the following general formula (3A) and having at least one or more hydroxy groups, a terminal group thereof being a group represented by any one of the following general formulae (1B) and (1C), and
• (III) a mixture of:
• a polymer having a repeating unit represented by the following general formula (2A) and having at least one or more fluorine atoms, a terminal group thereof being a group represented by any one of the following general formulae (1B) and (1C);
• and a polymer having a repeating unit represented by the following general formula (3A) and having at least one or more hydroxy groups, a terminal group thereof being a group represented by any one of the following general formulae (1B) and (1C);
• and
• (B) an organic solvent, and further comprising a polymer (IV), as a component (A′), having a repeating unit represented by the following general formula (4A) and a terminal group thereof being a group represented by the following general formula (2C),
• wherein W1 represents one or more kinds of tetravalent organic groups optionally having a fluorine atom or a hydroxy group, W2 represents one or more kinds of divalent organic groups optionally having a fluorine atom or a hydroxy group, at least one of W1 and W2 has one or more fluorine atoms, and at least one of W1 and W2 has one or more hydroxy groups,
• wherein W3 represents one or more kinds of tetravalent organic groups optionally having a fluorine atom, W4 represents one or more kinds of divalent organic groups optionally having a fluorine atom, and at least one of W3 and W4 has one or more fluorine atoms,
• wherein W5 represents one or more kinds of tetravalent organic groups optionally having a hydroxy group, W6 represents one or more kinds of divalent organic groups optionally having a hydroxy group, and at least one of W5 and W6 has one or more hydroxy groups, and
• wherein R1 represents any one group represented by the following formula (1D), and two or more kinds of R1 are optionally used in combination,
• wherein W7 represents a tetravalent organic group, and W8 represents a divalent organic group, and
• wherein R2 represents a monovalent organic group having 1 to 10 carbon atoms, n1 represents an integer of 0 or 1, and n2 and n3 represent 1≤n2≤6 and 0≤n3≤6 and satisfy a relationship of 1≤n2+n3≤6.