Bipolar electrostatic chuck electrode with self-induced DC voltage

A substrate support assembly, comprising:

• an electrostatic chuck body defining a substrate support surface that defines a substrate seat;
• a support stem coupled with the electrostatic chuck body;
• a first bipolar electrode embedded within the electrostatic chuck body;
• a second bipolar electrode embedded within the electrostatic chuck body radially inward of at least a portion of the first bipolar electrode and coaxial with the first bipolar electrode,
• an annular electrode disposed about the first bipolar electrode, wherein the annular electrode is DC floated and RF powered;
• and
• a mesh disposed within the electrostatic chuck body, the mesh coupling the annular electrode with an RF power supply, wherein a distance between the mesh and the annular electrode is from about 0.6 mm to about 8 mm.

A substrate support assembly, comprising:

• an electrostatic chuck body defining a substrate support surface that defines a substrate seat;
• a support stem coupled with the electrostatic chuck body;
• a first bipolar electrode embedded within the electrostatic chuck body, wherein the first bipolar electrode is coupled with at least one DC power supply and is supplied with a negative DC current;
• a second bipolar electrode embedded within the electrostatic chuck body wherein an entirety of the second bipolar electrode is radially inward of at least a portion of the first bipolar electrode and the second bipolar electrode is coaxial with the first bipolar electrode, and
• an annular electrode disposed about the first bipolar electrode, wherein the annular electrode is DC floated and RF powered and exhibits an induced DC current.