Substrate treating apparatus

A substrate treating apparatus for successively performing batch treatment for processing a plurality of substrates collectively and single-wafer treatment for processing the substrates one by one, the substrate treating apparatus comprising:

• a batch process tank configured to perform treatment on the plurality of substrates collectively;
• a batch substrate transport mechanism configured to transport the substrates in a vertical posture collectively to the batch process tank;
• a single-wafer processing chamber configured to perform treatment on the substrates one by one;
• a horizontal substrate transport mechanism configured to transport the substrates in a horizontal posture one by one to the single-wafer processing chamber;
• and
• a posture turning mechanism configured to turn a posture of the substrates, on which the batch treatment is performed, from vertical to horizontal,
• the posture turning mechanism including:
• a substrate holder configured to hold the substrates in the vertical posture that are arranged at a predetermined pitch;
• and
• a posture turning unit configured to receive the substrates from the substrate holder and turn a posture of the received substrates from vertical to horizontal, the posture turning unit including:
• two horizontal holder configured to house the substrates and place thereon when the substrates are in the horizontal posture;
• two vertical holders configured to hold the substrates, housed by the two horizontal holders, in the vertical posture when the substrates are in the vertical posture;
• a support base configured to support the two horizontal holders and the two vertical holders;
• a support base rotator configured to rotate the support base around a horizontal axis;
• and
• a state changing unit configured to change a state of the two vertical holders between a holding state where the two vertical holders can hold the substrates and a releasing state where the two vertical holders release the holding state,
• the two vertical holders being constituted by a first vertical holder and a second vertical holder, the first vertical holder including:
• a first rotating member extending perpendicular with respect to a support face of the support base;
• and
• a first holder body provided so as to protrude from the first rotating member in a direction orthogonal to an extension direction where the first rotating member extends, the second vertical holder including:
• a second rotating member extending perpendicular with respect to the support face of the support base;
• and
• a second holder body provided so as to protrude from the second rotating member in a direction orthogonal to an extension direction where the second rotating member extends,
• the first holder body and the second holder body each having a plurality of holding grooves provided along an alignment direction where the substrates are aligned,
• the state changing unit changing a state of the two vertical holder to either the holding state or the releasing state by causing the first holder body and the second holder body to rotate around the first rotating member and the second rotating member, respectively,
• when the substrates are to be held, the state changing unit changing the state of the two vertical holders into the holding state, whereby the first holder body and the second holder body grip the substrates, and
• when a posture of the substrates, held by the two vertical holders, is turned from vertical to horizontal by the support base rotator, the state changing unit changing the state of the two vertical holders into the releasing state, whereby the first holder body and the second holder body release the substrates.