Filling cracks on a substrate via
AssigneeMicron Technology, Inc.
InventorsQuang Nguyen, Christopher Glancey, Koustav Sinha
Life of this patent
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Abstract
A semiconductor device assembly is provided. The assembly includes a substrate having a first layer with a first contact and a second layer with a second contact. A via that includes a first conductive material electrically couples the first contact and the second contact. A second conductive material having a lower melting point than the first conductive material is disposed at least partially between the via and the second contact. When a crack occurs between the via and the second contact, the second conductive material may be heated to fill the crack. Thus, the techniques, apparatuses, and systems disclosed herein may provide a repairable substrate.
Claims10
A method of fabricating a via in a substrate, comprising:
- providing the substrate including a first layer having a first contact and a second layer having a second contact separated by a layer of non-conductive material;
- creating an opening at least through the layer of non-conductive material and between the first contact and the second contact;
- disposing a first conductive material in the opening on the second contact, the first conductive material having a first melting point;
- disposing a second conductive material in the opening on the first conductive material such that the first conductive material is disposed at least partially between the second conductive material and the second contact effective to implement a via that electrically couples the first contact and the second contact, the second conductive material having a second melting point higher than the first melting point;
- and
- heating the first conductive material to a temperature that is higher than the first melting point but lower than the second melting point to melt the first conductive material disposed at least partially between the second conductive material and the second contact.
A method of repairing a substrate, comprising:
- providing the substrate including:
- a first layer having a first contact;
- a second layer having a second contact;
- a via electrically coupling the first contact and the second contact, the via including (i) a first conductive material disposed on the second contact and having a first melting point and a second conductive material disposed on the first conductive material such that the first conductive material is disposed at least partially between the second conductive material and the second contact, the second conductive material having a second melting point that is higher than the first melting point, wherein the via is at least partially separated from the second contact by a crack;
- and
- heating the first conductive material to a temperature that is higher than the first melting point but lower than the second melting point to melt the first conductive material disposed at least partially between the second conductive material and the second contact, the heating effective to fill the crack with the first conductive material.
Dependencies are inferred from the claim text.