Measurement apparatus, lithography apparatus, and method of manufacturing article

A measurement apparatus that measures a position of an object, comprising:

• a detector configured to irradiate a measurement target point of the object with light having a plurality of wavelengths, and detect a position of the measurement target point based on the light reflected by the measurement target point;
• and
• a processor configured to determine the position of the object based on a detection result of the detector,
• wherein the detection result includes a combined error represented by a waveform formed by a combination of cyclic errors derived from the plurality of wavelengths of the light,
• wherein an amplitude of the waveform representing the combined error cyclically changes, due to interaction of the cyclic errors derived from the plurality of wavelengths of the light, in accordance with a distance between the detector and the object, and
• wherein the processor is configured to cause the detector to detect the position of the measurement target point of the object at the distance at which the amplitude of the combined error in the waveform formed by the combination of the cyclic errors derived from the plurality of wavelengths of the light falls within an allowable range.