Pattern exposure apparatus, device manufacturing method, and exposure apparatus
AssigneeNikon Corporation
InventorsMasaki Kato, Yasushi Mizuno, Toshiharu Nakashima, Satoshi Kawado
Life of this patent
Estimating the term…
Loading patent…
AssigneeNikon Corporation
InventorsMasaki Kato, Yasushi Mizuno, Toshiharu Nakashima, Satoshi Kawado
Estimating the term…
A pattern-exposure-apparatus includes: spatial-light-modulating-element including a plurality of micro-mirrors selectively driven based on drawing data, illumination-unit that irradiates spatial-light-modulating-element with illumination-light at predetermined-incidence-angle, and projection-unit that projects reflected-light from selected micro-mirrors of spatial-light-modulating-element in ON-state to substrate, and pattern-exposure-apparatus projects and exposes pattern corresponding to drawing data to substrate, illumination-unit including condensing-optical-member that condenses light from surface-light-source having predetermined shape so as to obliquely irradiate light to spatial-light-modulating-element and that is disposed along optical-axis which is inclined at incidence-angle with respect to optical-axis of projection-unit so as to optically conjugate surface-light-source with pupil of projection-unit, and correcting-optical-member that deforms shape of outline of the surface-light-source so as to correct distortion of outline of image of the surface-light-source, which is formed on pupil of the projection-unit by reflected-light from micro-mirrors of the spatial-light-modulating-element in ON-state, into elliptical-shape according to incidence-angle.
A pattern exposure apparatus comprising:
A device manufacturing method of forming a pattern for an electronic device onto a substrate by obliquely illuminating illumination light from an illumination unit to a spatial light modulating element including a plurality of micro mirrors selectively driven based on drawing data of the pattern for the electronic device and by projecting and exposing reflected light from selected micro mirrors of the spatial light modulating element in an ON state to the substrate via a projection unit,
An exposure apparatus comprising:
Dependencies are inferred from the claim text.