Imprint method for fabrication of low density nanopore membrane
AssigneeSeagate Technology LLC
InventorsThomas Chang, Kim Yang Lee
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Abstract
A method of manufacturing a synthetic nanopore device for DNA sequencing disclosed herein includes providing a base template, forming a guiding layer on top of the base template, and forming a photoresist layer on top of the guiding layer. The photoresist layer is patterned, and the guiding layer is etched for form a guiding pattern. The photoresist layer is removed to form a guiding template and a self-assembled monolayer is deposited on at least a portion of the guiding template to form a patterned template. The patterned template is exposed to one or more etch processes to form a nanoimprint lithography template. A membrane is imprinted with the nanoimprint lithography template to form an array of nanopores in the membrane.
Claims20
A method of manufacturing a synthetic nanopore device for DNA sequencing, the method comprising the steps of:
- providing a base template;
- forming a guiding layer on top of the base template, wherein the guiding layer is patterned to guide self-assembly;
- forming a photoresist layer on top of the guiding layer;
- patterning the photoresist layer and etching the guiding layer to form a guiding pattern;
- removing the photoresist layer to form a guiding template;
- depositing a self-assembled monolayer on at least a portion of the guiding template to form a patterned template wherein the patterned template is configured to act as a masking structure;
- exposing the patterned template to one or more etch processes to form a nanoimprint lithography template;
- and
- imprinting a membrane with the nanoimprint lithography template to form an array of nanopores in the membrane.
A method of manufacturing a synthetic nanopore device for DNA sequencing, the method comprising the steps of:
- providing a base template;
- forming a guiding layer on top of the base template, wherein the guiding layer is patterned to guide self-assembly;
- forming a photoresist layer on top of the guiding layer;
- patterning the photoresist layer and etching the guiding layer to form a guiding pattern;
- removing the photoresist layer and etching the base template to form a guiding template;
- depositing a self-assembled monolayer on at least a portion of the guiding template to form a patterned template,
- exposing the patterned template to at least one etch process to form a nanoimprint lithography template, wherein the nanoimprint lithography template comprises one or more levels;
- providing a substrate wherein the substrate comprises a mechanical support layer and a membrane;
- and
- imprinting the membrane with the nanoimprint lithography template to form an array of mechanically supported nanopores in the membrane.
Dependencies are inferred from the claim text.