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US 12,585,191 B2Granted
Photolithography apparatus and method for forming photoresist pattern
AssigneeSamsung Display Co., Ltd.
InventorsYong Hwan Ryu, Sang Jin Park, Sa Rah Lee, Sung Bae Ju
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Abstract
A photolithography apparatus includes a cleaning unit which cleans a target substrate, a drying unit which dries the target substrate provided from the cleaning unit, and a coating unit which forms a photoresist layer by coating a photoresist on the target substrate provided from the drying unit. The drying unit includes a first vacuum unit which performs a vacuum treatment on the target substrate.
Claims20
A photolithography apparatus comprising:
- a cleaning unit which cleans a target substrate;
- a drying unit which dries the target substrate provided from the cleaning unit;
- and
- a coating unit which forms a photoresist layer by coating a photoresist on the target substrate provided from the drying unit,
- wherein the drying unit includes a first vacuum unit which performs a vacuum treatment to remove liquid remaining on the target substrate after the target substrate is cleaned by the cleaning unit and before the target substrate is provided to the coating unit.
2 more elements
A method of forming a photoresist pattern, the method comprising:
- cleaning a target substrate;
- drying the target substrate;
- and
- forming a photoresist layer by applying a photoresist on the target substrate,
- wherein the drying the target substrate comprises performing a vacuum treatment to remove liquid remaining on the target substrate after the cleaning the target substrate and before the forming the photoresist layer by applying the photoresist on the target substrate.
2 more elements
Dependencies are inferred from the claim text.