Anti-reflection structure, base material with anti-reflection structure, camera module and information terminal device
AssigneeDexerials Corporation
InventorsHiroshi Sugata, Hiroshi Tazawa, Shunichi Kajiya
Life of this patent
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Abstract
Provided is an anti-reflection structure with excellent anti-reflection performance and transparency, and with reduced generation of wrinkles on the surface. The present disclosure is an anti-reflection structure 10 including at least an adhesion layer 20 and an anti-reflection layer 30 formed on the adhesion layer 20 and having fine uneven structures on both sides thereof. The storage elastic modulus E′ of the adhesion layer 20 is equal to or greater than 25 MPa, and fine uneven structures formed on both sides of the anti-reflection layer 30 each have an uneven period P equal to or less than the wavelength of visible light.
Claims5
An anti-reflection structure comprising at least an adhesion layer and an anti-reflection layer formed on the adhesion layer and having fine uneven structures on both sides thereof, wherein
- a storage modulus of the adhesion layer measured under the conditions of frequency:
- 1 Hz, tension/compression force:
- 98 mN, temperature range:
- −50 to 200° C. and measurement temperature:
- 40° C. is equal to or greater than 25 MPa (MegaPascal) and equal to or less than 2.1 GPa (GigaPascal),
- the fine uneven structures formed on both sides of the anti-reflection layer each have an uneven period equal to or less than a wavelength of visible light, and
- wherein a thickness T1 of the adhesion layer relative to a thickness T2 of the anti-reflection layer is from 5 to 300, in which the thickness T1 of the adhesion layer and the thickness T2 of the anti-reflection layer are the thicknesses T1 and T2 of thickness portions in a laminating direction.
A base material with anti-reflection structure comprising a base material, an adhesion layer formed on the base material, and an anti-reflection layer formed on the adhesion layer and having fine uneven structures on both sides thereof, wherein
- a storage modulus of the adhesion layer measured under the conditions of frequency:
- 1 Hz, tension/compression force:
- 98 mN, temperature range:
- −50 to 200° C. and measurement temperature:
- 40° C. is equal to or greater than 25 MPa (MegaPascal) and equal to or less than 2.1 GPa (GigaPascal);
- the fine uneven structures formed on both sides of the anti-reflection layer each have an uneven period equal to or less than a wavelength of visible light, and
- wherein a thickness T1 of the adhesion layer relative to a thickness T2 of the anti-reflection layer is from 5 to 300, in which the thickness T1 of the adhesion layer and the thickness T2 of the anti-reflection layer are the thicknesses T1 and T2 of thickness portions in a laminating direction.
Dependencies are inferred from the claim text.