Vapor chamber system

A vapor chamber system, comprising:

• a heat source;
• a vapor chamber device, comprising:
• a first casing comprising a first plate, a first capillary structure at an inner surface of the first plate, and a first lateral wall protruding from the inner surface and surrounding the first capillary structure, wherein the heat source is in contact with an outer surface of the first plate;
• a second casing stacked on the first casing and comprising a second plate, a plurality of supporting posts protruding from the second plate, and a second lateral wall protruding from the second plate and surrounding the supporting posts, wherein the supporting posts face towards the first capillary structure, and the first lateral wall is connected to the second lateral wall;
• a second capillary structure disposed between the first capillary structure and the supporting posts of the second casing, wherein the supporting posts abut against the second capillary structure;
• and
• a third capillary structure disposed at a zone of the inner surface of the first plate, wherein the third capillary structure comprises metal powders or non-woven metal wool, the zone is within a projection of the heat source projected onto the inner surface, and an area of the zone is smaller than an area of the projection of the heat source.