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US 12,584,219 B2Granted
Methods for controlling pulse shape in ALD processes
AssigneeApplied Materials, Inc.
InventorsJoseph AuBuchon, Kevin Griffin, Hanhong Chen
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Abstract
Methods for controlling pulse shape in ALD processes improves local non-uniformity issues of films deposited on substrate surface. The methods include using a variable flow valve creating predetermined pulse shape when a reactant is provided on a substrate surface.
Claims17
A gas delivery system comprising:
- a gas reservoir having a charged pressure;
- a variable flow valve;
- and
- a controller configured to control the variable flow valve to generate a predetermined flow pulse profile downstream of the variable flow valve at an inner and outer region of a substrate support,
- wherein the variable flow valve is configured to provide a flow pulse profile from a pulse start to a pulse end with a pulse maximum flow at the pulse start and tapering to a pulse minimum flow at the pulse end.
2 more elements
Dependencies are inferred from the claim text.