Apparatus for manufacturing semiconductor device

An apparatus for manufacturing a semiconductor device, the apparatus comprising:

• a boat configured to support a plurality of substrates stacked at certain intervals;
• a first tube surrounding the boat in a lateral direction and having a cylindrical shape with an upper portion thereof being open;
• a second tube surrounding the first tube in a lateral direction and comprising a closed upper portion;
• a manifold provided under the second tube;
• a lid member provided under the manifold;
• a rotation driving device configured to rotate the boat;
• a vertical driving device configured to raise and lower the boat;
• and
• a first cleaning gas supply nozzle including a first segment passing through the manifold and extending in a horizontal direction from an outer portion of the second tube to an interior portion of the first tube, a second segment extending in a vertical direction between an inner concave surface of the interior sidewall of the first tube and an outer convex surface of the boat, and a third segment extending in a direction differing from the extension direction of the second segment from an end of the second segment;
• and
• a process gas supply nozzle extending from the outer portion of the first tube to the interior portion of the first tube,
• wherein an end of the third segment includes a first nozzle tip,
• wherein the first cleaning gas supply nozzle is configured to emit a cleaning gas at an oblique angle with respect to the vertical direction,
• wherein the third segment has a curved profile that is parallel to a corresponding section of an inner concave surface of the interior sidewall of the first tube, and is disposed adjacent to the inner concave surface of the interior sidewall of the first tube such that points along a length of the curved profile are equidistant from the corresponding section of the inner concave surface of the interior sidewall of the first tube,
• wherein the end of the second segment, from which the third segment extends, is positioned between the inner concave surface of the interior sidewall of the first tube and the outer convex surface of the boat, and at a level in the lengthwise direction that is lower than the top of the boat,
• wherein a Reynolds number of a cleaning gas discharged from the first nozzle tip is 10 to 2,100 so that a laminar flow of the cleaning gas discharged from the first nozzle tip is formed,
• wherein the first nozzle tip is configured to be laterally spaced from the outer convex surface of the boat, and
• wherein the cleaning gas flows spirally along the inner concave surface of the interior sidewall of the first tube on the basis of a Coanda effect.

An apparatus for manufacturing a semiconductor device, the apparatus comprising:

• a boat configured to support a plurality of stacked substrates;
• a first tube surrounding the boat in a lateral direction and having a cylindrical shape with an upper portion thereof being open;
• a cleaning gas supply nozzle including a first segment extending from an outer portion of the first tube to an interior portion of the first tube between an inner concave surface of the interior sidewall of the first tube and an outer convex surface of the boat, a second segment extending in a lengthwise direction of the first tube from an end of the first segment, and a third segment extending in a direction differing from the extension direction of the second segment from an end of the second segment;
• and
• a process gas supply nozzle extending from the outer portion of the first tube to the interior portion of the first tube,
• wherein an end of the third segment includes a nozzle tip,
• wherein the third segment has a curved profile that is parallel to a corresponding section of an inner concave surface of the interior sidewall of the first tube, and is disposed adjacent to the inner concave surface of the interior sidewall of the first tube such that points along a length of the curved profile are equidistant from the corresponding section of the inner concave surface of the interior sidewall of the first tube,
• wherein the end of the second segment, from which the third segment extends, is positioned between the inner concave surface of the interior sidewall of the first tube and the outer convex surface of the boat, and at a level in the lengthwise direction that is lower than the top of the boat,
• wherein the nozzle tip is configured to be laterally spaced apart from the outer convex surface of the boat, and
• wherein a cleaning gas discharged from the cleaning gas supply nozzle flows spirally along the inner concave surface of the interior sidewall of the first tube on the basis of a Coanda effect.