Compositions and methods using same for germanium seed layer
AssigneeVersum Materials US, LLC
InventorsMatthew R. Macdonald, Manchao Xiao
Life of this patent
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Abstract
Precursors and methods for (a) forming silicon-containing films and (b) functionalizing substrate surfaces in order to generate a germanium seed layer suitable for deposition of Ge films. In one aspect, there is provided a precursor of Formula I and/or a precursor of Formula II: as described herein.
Claims11
A method of forming a germanium-containing film on at least one surface of a substrate by a deposition process, the method comprising:
- providing the at least one surface of the substrate in a reaction chamber, the substrate having exposed surface hydroxy groups;
- introducing into the reaction chamber at least one organoamino-vinylsilane precursor comprising at least one vinyl group and at least one organoamino anchoring group connected to at least one silicon atom represented by the following Formula I, or at least one organoamino-allylsilane precursor comprising at least one allyl group and at least one organoamino anchoring group connected to at least one silicon atom represented by the following Formula II:
- wherein R1 is selected from the group consisting of a linear or branched C1 to C10 alkyl group, a linear or branched C3 to C10 alkenyl group, a linear or branched C3 to C10 alkynyl group, a C3 to C10 cyclic alkyl group, and a C6 to C10 aryl group;
- R2 is selected from the group consisting of hydrogen, a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C6 alkenyl group, a linear or branched C3 to C6 alkynyl group, a C3 to C10 cyclic alkyl group, and a C6 to C10 aryl group;
- R3 and R4 are each independently selected from the group consisting of hydrogen, a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C6 alkenyl group, a linear or branched C3 to C6 alkynyl group, a C3 to C10 cyclic alkyl group, a C6 to C10 aryl group, a C1 to C10 linear, cyclic, or branched alkoxy group, an organoamino group (NR1R2) as defined above, and a halide selected from the group consisting of Cl, Br, and I;
- purging the reaction chamber with purge gas;
- introducing into the reaction chamber at least one first germanium-containing precursor comprising at least one Ge—H bond;
- purging the reaction chamber with purge gas;
- introducing into the reaction chamber at least one second germanium-containing precursor that is the same as or different from the first germanium-containing precursor.
A composition comprising at least one organoamino-vinylsilane precursor selected from the group consisting of tris(ethylamino)vinylsilane, tris(iso-propylamino)vinylsilane, tris(tert-butylamino)vinylsilane, tris(N-ethylmethylamino)vinylsilane, tris(N-methylcyclohexylamino)vinylsilane, tris(N-methylphenylamino)vinylsilane, tri(pyrrolidino)vinylsilane, tri(piperidino)vinylsilane tri(pyrrolyl)vinylsilane, bis(ethylamino)methylvinylsilane, bis(tert-butylamino)methylvinylsilane, bis(N-methylcyclohexylamino)methylvinylsilane, bis(N-methylphenylamino)methylvinylsilane, di(pyrrolidino)methylvinylsilane, di(piperidino)methylvinylsilane, di(pyrrolyl)methylvinylsilane, bis(ethylamino)divinylsilane, bis(n-propylamino)divinylsilane, bis(sec-butylamino)divinylsilane, bis(N-ethylmethylamino)divinylsilane, bis(diethylamino)divinylsilane, bis(N-methylcyclohexylamino)divinylsilane, bis(N-methylphenylamino)divinylsilane, di(pyrrolidino)divinylsilane, di(piperidino)divinylsilane, di(pyrrolyl)divinylsilane, (n-propylamino)dimethylvinylsilane, (sec-butylamino)dimethylvinylsilane, (tert-butylamino)dimethylvinylsilane, (N-ethylmethylamino)dimethylvinylsilane, (N-methylcyclohexylamino)dimethylvinylsilane, (N-methylphenylamino)dimethylvinylsilane, (pyrrolidino)dimethylvinylsilane, (piperidino)dimethylvinylsilane, (pyrrolyl)dimethylvinylsilane, (methylamino)methyldivinylsilane, (ethylamino)methyldivinylsilane, (n-propylamino)methyldivinylsilane, (iso-propylamino)methyldivinylsilane, (sec-butylamino)methyldivinylsilane, (tert-butylamino)methyldivinylsilane, (dimethylamino)methyldivinylsilane, (N-ethylmethylamino)methyldivinylsilane, (N-methylcyclohexylamino)methyldivinylsilane, (N-methylphenylamino)methyldivinylsilane, (pyrrolidino)methyldivinylsilane, (piperidino)methyldivinylsilane, (pyrrolyl)methyldivinylsilane, (methylamino)trivinylsilane, (ethylamino)trivinylsilane, (n-propylamino)trivinylsilane, (iso-propylamino)trivinylsilane, (sec-butylamino)trivinylsilane, (tert-butylamino)trivinylsilane, (N-ethylmethylamino)trivinylsilane, (diethylamino)trivinylsilane, (N-methylcyclohexylamino)trivinylsilane, (N-methylphenylamino)methyldivinylsilane, (pyrrolidino)methyltrivinylsilane, (piperidino)trivinylsilane, and (pyrrolyl)trivinylsilane.
A composition comprising at least one compound selected from the group consisting of tris(methylamino)allylsilane, tris(ethylamino)allylsilane, tris(n-propylamino)allylsilane, tris(iso-propylamino)allylsilane, tris(sec-butylamino)allylsilane, tris(tert-butylamino)allylsilane, tris(N-methylcyclohexylamino)allylsilane, tris(N-methylphenylamino)allylsilane, tri(pyrrolidino)allylsilane, tri(piperidino)allylsilane tri(pyrrolyl) allylsilane, bis(ethylamino)methylallylsilane, bis(n-propylamino)methylallylsilane, bis(sec-butylamino)methylallylsilane, bis(tert-butylamino)methylallylsilane, bis(N-methylcyclohexylamino)methylallylsilane, bis(N-methylphenylamino)methylallylsilane, di(pyrrolidino)methylallylsilane, di(piperidino)methylallylsilane, di(pyrrolyl)methylallylsilane, bis(methylamino)diallylsilane, bis(ethylamino)diallylsilane, bis(n-propylamino)diallylsilane, bis(sec-butylamino)diallylsilane, bis(diethylamino)diallylsilane, bis(N-methylcyclohexylamino)diallylsilane, bis(N-methylphenylamino)diallylsilane, di(pyrrolidino)diallylsilane, di(piperidino)diallylsilane, di(pyrrolyl)diallylsilane, (ethylamino)dimethylallylsilane, (n-propylamino)dimethylallylsilane, (iso-propylamino)dimethylallylsilane, (sec-butylamino)dimethylallylsilane, (tert-butylamino)dimethylallylsilane, (N-ethylmethylamino)dimethylallylsilane, (N-methylcyclohexylamino)dimethylallylsilane, (N-methylphenylamino)dimethylallylsilane, (pyrrolidino)dimethylallylsilane, (piperidino)dimethylallylsilane, (pyrrolyl)dimethylallylsilane, (methylamino)methyldiallylsilane, (ethylamino)methyldiallylsilane, (n-propylamino)methyldiallylilane, (iso-propylamino)methyldiallylsilane, (sec-butylamino)methyldiallylsilane, (tert-butylamino)methyldiallylsilane, (dimethylamino)methyldiallylsilane, (N-ethylmethylamino)methyldiallylsilane, (N-methylcyclohexylamino)methyldiallylsilane, (N-methylphenylamino)methyldiallylsilane, (pyrrolidino)methyldiallylsilane, (piperidino)methyldiallylsilane, (pyrrolyl)methyldiallylsilane, (methylamino)triallylsilane, (ethylamino)triallylsilane, (n-propylamino)triallylsilane, (iso-propylamino)triallylsilane, (sec-butylamino)triallylsilane, (tert-butylamino)triallylsilane, (dimethylamino)triallylsilane, (N-ethylmethylamino)triallylsilane, (diethylamino)triallylsilane, (N-methylcyclohexylamino)triallylsilane, (N-methylphenylamino)methyldiallylsilane, (pyrrolidino)methyltriallylsilane, (piperidino)triallylsilane, and (pyrrolyl)triallylsilane.
Dependencies are inferred from the claim text.