Process chamber with UV irradiance
AssigneeYield Engineering Systems, Inc.
InventorsTapani Laaksonen, M Ziaul Karim, Christopher Lane, Craig Walter McCoy, Ramakanth Alapati
Life of this patent
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Abstract
A semiconductor processing apparatus includes a process chamber that defines an enclosure. The enclosure includes a substrate support configured to support a substrate and rotate the substrate about a central axis of the process chamber. The substrate support is also configured to move vertically along the central axis and position the substrate at multiple locations in the enclosure. The apparatus also includes one or more UV lamps configured to irradiate a top surface of the substrate supported on the substrate support.
Claims23
A semiconductor processing apparatus, comprising:
- a process chamber defining an enclosure;
- a substrate support configured to (a) support a substrate, (b) rotate with the substrate about a central axis of the process chamber, and (c) move vertically along the central axis to position the substrate at multiple locations in the enclosure;
- one or more UV lamps configured to irradiate a top surface of the substrate supported on the substrate support;
- and
- one or more motors configured to rotate the substrate support about the central axis and move the substrate support vertically along the central axis,
- wherein the process chamber comprises a liquid-cooled cold plate that defines a bottom wall of the enclosure.
A semiconductor processing apparatus, comprising:
- a process chamber defining an enclosure;
- a substrate support positioned in the enclosure and configured to (a) support a substrate thereon, (b) rotate along with the substrate about a central axis of the process chamber, and (c) move vertically along the central axis to position the substrate at multiple locations in the enclosure;
- a liquid-cooled cold plate that defines a bottom wall of the enclosure;
- a transparent window that defines a top wall of the enclosure;
- and
- one or more UV lamps, wherein the one or more UV lamps are configured to irradiate a top surface of the substrate supported on the substrate support through the transparent window.
Dependencies are inferred from the claim text.