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US 12,582,942 B2Granted
Gas processing apparatus and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsKeisuke Tsugao, Daisuke Aoki
Life of this patent
Estimating the term…
Abstract
A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate. The gas passing through the flow path is brought into contact with the dissolving liquid retained in the partition plate.
Claims17
A gas processing apparatus, comprising:
- multiple ducts including a first duct having therein a first flow path through which gas passes, and a second duct having therein a second flow path through which the gas passes;
- a partition plate formed of a porous material, through which the gas passes, and configured to retain a liquid;
- wherein the partition plate is disposed in each of the first flow path and the second flow path to partition each of the first flow path and the second flow path into multiple spaces,
- a liquid supply configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate;
- and
- a storage tank configured to store the dissolving liquid falling from the partition plate,
- wherein the gas passing through the flow paths is brought into contact with the dissolving liquid retained in the partition plate, and
- wherein the liquid supply comprises:
- a first liquid supply configured to supply the dissolving liquid supplied from a dissolving liquid source to the partition plate;
- and
- a second liquid supply configured to supply a circulating liquid obtained by circulating the dissolving liquid stored in the storage tank through a circulation path to the partition plate,
- wherein the liquid supply includes multiple liquid supplies, and at least one of the multiple liquid supplies is disposed in each of the multiple spaces.
9 more elements
A substrate processing apparatus, comprising:
- multiple processing units each configured to process a substrate by using a chemical;
- an exhaust path through which a gas exhausted from the multiple processing units flows;
- and
- a gas processing apparatus provided in the exhaust path to remove a target component contained in the gas flowing through the exhaust path from the gas, wherein the gas processing apparatus comprises:
- multiple ducts including a first duct having therein a first flow path through which gas passes, and a second duct having therein a second flow path through which the gas passes;
- a partition plate formed of a porous material, through which the gas passes, configured to retain a liquid;
- wherein the partition plate is disposed in each of the first flow path and the second flow path to partition each of the first flow path and the second flow path into multiple spaces,
- a liquid supply configured to supply a dissolving liquid configured to dissolve the target component contained in the gas to the partition plate;
- and a storage tank configured to store the dissolving liquid falling from the partition plate, and
- wherein the gas passing through the flow paths is brought into contact with the dissolving liquid retained in the partition plate, and
- wherein the liquid supply comprises:
- a first liquid supply configured to supply the dissolving liquid supplied from a dissolving liquid source to the partition plate;
- and
- a second liquid supply configured to supply a circulating liquid obtained by circulating the dissolving liquid stored in the storage tank through a circulation path to the partition plate,
- wherein the liquid supply includes multiple liquid supplies, and at least one of the multiple liquid supplies is disposed in each of the multiple spaces.
12 more elements
A gas processing apparatus, comprising:
- multiple ducts including a first duct having therein a first flow path through which gas passes, and a second duct having therein a second flow path through which the gas passes;
- a porous member disposed in each of the first flow path and the second flow path, configured to divide each of the first flow path and the second flow path into multiple spaces, and formed of a porous material, through which the gas passes, and configured to retain a liquid;
- a liquid supply configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the porous member;
- and
- a storage tank configured to store the dissolving liquid falling from the porous member,
- wherein the porous material forming the porous member is porous ceramic,
- wherein the gas passing through the flow paths is brought into contact with the dissolving liquid retained in the porous member, and
- wherein the liquid supply comprises:
- a first liquid supply configured to supply the dissolving liquid supplied from a dissolving liquid source to the porous member;
- and
- a second liquid supply configured to supply a circulating liquid obtained by circulating the dissolving liquid stored in the storage tank through a circulation path to the porous member,
- wherein the liquid supply includes multiple liquid supplies, and at least one of the multiple liquid supplies is disposed in each of the multiple spaces.
9 more elements
Dependencies are inferred from the claim text.