Module for measuring current/voltage/power of plasma apparatus and plasma apparatus including the same

A module for measuring current/voltage/power of a plasma apparatus,

• wherein the module is configured to be used with the plasma apparatus, the plasma apparatus comprising:
• a process chamber having a sealed processing space in which plasma is formed;
• a substrate support unit disposed in the processing space;
• and
• a gas injection unit configured to inject gas into the processing space,
• wherein the module is configured to be disposed adjacent to at least one application line among a first power application line and a ground line of the plasma apparatus to measure an RF voltage, current, and power of an input wave and a reflected wave, and
• wherein the module comprises:
• a first directional coupler disposed adjacent to the application line to measure power output by the input wave;
• a second directional coupler disposed adjacent to the application line to measure power output by the reflected wave;
• a voltage measurement unit disposed adjacent to the application line to measure the RF voltage by using capacitance;
• and
• a current measurement unit disposed adjacent to the application line to measure the RF current by using inductance.