Method for producing alkali vapor cell and alkali vapor cell
AssigneeHamamatsu Photonics K.K.
InventorMasaki Yamada
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Abstract
A method for producing an alkali vapor cell includes a step of preparing a first member and a second member; a step of forming a first metal film on a surface of the first member; a step of forming a second metal film on a surface of the second member; a step of disposing a simple substance of the alkali metal; and a step of directly bonding the first metal film and the second metal film to each other in a normal temperature environment, in which in the step of forming the first metal film, the first metal film is formed so that a thickness of the first metal film is 100 nm or less, and in the step of forming the second metal film, the second metal film is formed so that a thickness of the second metal film is 100 nm or less.
Claims14
A method for producing an alkali vapor cell comprising:
- a step of preparing a first member and a second member constituting at least a part of a container for enclosing an alkali metal;
- a step of forming a first metal film on a surface of the first member;
- a step of forming a second metal film on a surface of the second member;
- a step of disposing a simple substance of the alkali metal on at least a partial region of the surface of the first member and the surface of the second member;
- and
- a step of directly bonding the first metal film and the second metal film to each other in a normal temperature environment, wherein
- in the step of forming the first metal film, the first metal film is formed so that a thickness of the first metal film is 100 nm or less,
- in the step of forming the second metal film, the second metal film is formed so that a thickness of the second metal film is 100 nm or less, and
- the step of disposing the simple substance of the alkali metal includes at least one of a step of disposing the simple substance of the alkali metal on at least a partial region of the surface of the first member in a state where the first metal film is covered with a first mask, and a step of disposing the simple substance of the alkali metal on at least a partial region of the surface of the second member in a state where the second metal film is covered with a second mask.
A method for producing an alkali vapor cell comprising:
- a step of preparing a first member and a second member constituting at least a part of a container for enclosing an alkali metal;
- a step of forming a first metal film on a surface of the first member;
- a step of forming a second metal film on a surface of the second member;
- a step of disposing a simple substance of the alkali metal on at least a partial region of the surface of the first member and the surface of the second member;
- and
- a step of directly bonding the first metal film and the second metal film to each other in a normal temperature environment, wherein
- in the step of forming the first metal film, the first metal film is formed so that a thickness of the first metal film is 100 nm or less,
- in the step of forming the second metal film, the second metal film is formed so that a thickness of the second metal film is 100 nm or less, and
- in the step of forming the first metal film, a first layer is formed of chromium on the surface of the first member, a second layer is formed of platinum or nickel on the first layer, and the first metal film is formed on the second layer.
A method for producing an alkali vapor cell comprising:
- a step of preparing a first member and a second member constituting at least a part of a container for enclosing an alkali metal;
- a step of forming a first metal film on a surface of the first member;
- a step of forming a second metal film on a surface of the second member;
- a step of disposing a simple substance of the alkali metal on at least a partial region of the surface of the first member and the surface of the second member;
- and
- a step of directly bonding the first metal film and the second metal film to each other in a normal temperature environment, wherein
- in the step of forming the first metal film, the first metal film is formed so that a thickness of the first metal film is 100 nm or less,
- in the step of forming the second metal film, the second metal film is formed so that a thickness of the second metal film is 100 nm or less, and
- in the step of forming the second metal film, a third layer is formed of chromium on the surface of the second member, a fourth layer is formed of platinum or nickel on the third layer, and the second metal film is formed on the fourth layer.
Dependencies are inferred from the claim text.