Substrate rotating apparatus, substrate processing system including the same, and substrate processing method using the same

A substrate processing system, comprising:

• a drying chamber configured to be used to dry a substrate;
• and
• a drying fluid supplying part configured to supply a drying fluid to the drying chamber,
• wherein the drying chamber comprises:
• a chamber housing provided to have a process space;
• and
• a substrate rotating apparatus disposed in the chamber housing,
• wherein the substrate rotating apparatus comprises:
• a stage;
• and
• a spin chuck configured to support the substrate and configured to be levitated upward from the stage to rotate in a non-contact state with the stage,
• wherein the stage is positioned underneath the spin chuck and is configured to rotate the spin chuck about an axis parallel to a first direction,
• wherein the spin chuck comprises:
• a first magnetic element;
• and
• a substrate supporting member provided on the first magnetic element,
• wherein the stage comprises:
• a stage housing;
• a rotating part configured to rotate about the parallel to the first direction;
• an inner control unit configured to control rotation of the rotating part;
• a power supplying part configured to supply a power to the rotating part;
• and
• a wireless communication part configured to receive a control signal from an outside and to transmit the received control signal to the inner control unit,
• wherein the rotating part comprises:
• a second magnetic element spaced apart from the first magnetic element;
• and
• a rotation driver configured to rotate t de second magnetic element and wherein the rotating part, the inner control unit, the power supplying part, and the wireless communication part are hermetically sealed within the stage housing.

A substrate processing method, comprising:

• disposing a substrate in a drying chamber;
• rotating the substrate;
• and
• supplying a drying fluid into the drying chamber,
• wherein the disposing of the substrate in the drying chamber comprises placing the substrate on a spin chuck of a substrate rotating apparatus, the spin chuck comprising a first magnetic element and a substrate supporting member provided on the first magnetic element,
• wherein the rotating of the substrate comprises:
• levitating the spin chuck from a stage positioned the spin chuck, the stage being configured to pin chu about an axis parallel to a first direction;
• and
• rotating the spin chuck using the stage,
• wherein the stage comprises:
• a stage housing;
• a rotating part configured to rotate about the axis parallel to the first direction;
• an inner control configured to control rotation of the rotating part;
• a power supplying part configured to supply a power to the rotating part;
• and
• a wireless communication part configured to receive a control signal from an outside and configured to transmit the control signal to the inner control unit,
• wherein the rotating part comprises:
• a second magnetic element spaced apart from the first magnetic element;
• and
• a rotation driver configured to rotate the second magnetic element,
• wherein the rotating of the spin chuck comprises rotating the spin chuck using the power, which is supplied from the power supplying part placed in the stage housing to rotate the second magnet element of the rotating part, and
• wherein the rotating part, the inner control unit, the power supplying part, and the wireless communication part are hermetically sealed within the stage housing.