Film thickness measuring device and film thickness measuring method
AssigneeHamamatsu Photonics K.K.
InventorsTomonori Nakamura, Kenichi Ohtsuka, Satoshi Arano, Kunihiko Tsuchiya
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AssigneeHamamatsu Photonics K.K.
InventorsTomonori Nakamura, Kenichi Ohtsuka, Satoshi Arano, Kunihiko Tsuchiya
Estimating the term…
A film thickness measuring apparatus includes a light irradiation unit configured to irradiate an object with light in a planar shape, an optical element having a transmittance and a reflectance changing according to wavelengths in a predetermined wavelength range, the optical element being configured to separate light from the object by transmitting and reflecting the light, an imaging unit configured to photograph light separated by the optical element, and an analysis unit configured to estimate a film thickness of the object based on a signal from the imaging unit photographing light, in which the light irradiation unit emits light having a wavelength included in the predetermined wavelength range of the optical element.
A film thickness measuring apparatus comprising:
A film thickness measuring method comprising:
Dependencies are inferred from the claim text.