Reaction gas supply system
AssigneeSamsung Electronics Co., Ltd.
InventorsJungjoon Pyeon, Seoyoung Maeng, Iljun Jeon, Suji Gim, Youngseok Roh, Jongyong Bae
Life of this patent
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Abstract
A reaction gas supply system includes a reaction chamber configured to process a substrate using a reaction gas, a mass flow controller (MFC) configured to control an amount of the reaction gas supplied to the reaction chamber, a tank between the reaction chamber and the MFC, the tank having a cylindrical inner space configured to store the reaction gas, and an outlet portion configured to discharge the reaction gas from the tank, and a valve between the tank and the reaction chamber, the outlet portion of the tank having a gradually decreasing diameter toward the valve.
Claims12
A reaction gas supply system, comprising:
- an evaporator configured to evaporate a reaction material to form a reaction gas;
- a mass flow controller (MFC) configured to control an amount of the reaction gas supplied to a reaction chamber, the reaction chamber being configured to process a substrate using the reaction gas;
- a tank between the reaction chamber and the MFC, the tank being configured to store the reaction gas, and the tank having a volume of about 0.16 L to about 0.24 L;
- and
- a valve between the tank and the reaction chamber,
- wherein the tank includes an outlet portion connected to the valve and an inlet portion, which is located opposite to the outlet portion in a length direction of the tank, connected to the MFC,
- wherein each of the inlet portion and the outlet portion have a conical shape with inner sidewalls inclined toward an axial direction of the tank,
- wherein the inlet portion has a gradually decreasing diameter from the tank toward the MFC,
- wherein the outlet portion has decreasing diameter from the tank toward the valve, and
- wherein an inner surface of the tank comprises a spiral groove that extends in a spiral pattern along a length of the tank and along surfaces of the inner sidewalls of the outlet portion and the inlet portion,
- wherein a first duct is connected between the evaporator and the tank, and the MFC is installed at the first duct,
- wherein a second duct is connected between the tank and the reaction chamber, and the valve is installed at the second duct,
- wherein the first duct is in fluid communication with the inlet portion of the tank, and a minimum diameter of the inlet portion corresponds to a diameter of the first duct,
- wherein the second duct is in fluid communication with the outlet portion of the tank, and a minimum diameter of the outlet portion corresponds to a diameter of the second duct, and
- wherein the spiral groove extends continuously on the inner surface of the tank and the surfaces of the inner sidewalls of the outlet portion and the inlet portion.
Dependencies are inferred from the claim text.