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US 12,577,358 B2Granted
Gas barrier film and method of producing the same
AssigneeToppan Printing Co., Ltd.
InventorsYusuke Kuwagata, Yasunori Kurauchi, Toshiaki Yoshihara, Takafumi Horiike
Life of this patent
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Abstract
A gas barrier film including: a plastic substrate; an atomic layer deposition film disposed on the plastic substrate; and an overcoat layer disposed on the atomic layer deposition film. The overcoat layer contains a thermoplastic resin, and has a glass transition temperature in a range of 20° C. or more and 100° C. or less.
Claims9
A gas barrier film, comprising:
- a plastic substrate;
- a barrier layer containing an inorganic substance, the barrier layer being disposed on the plastic substrate;
- and
- an overcoat layer disposed on the barrier layer, wherein the overcoat layer consists of a thermoplastic resin, and has a glass transition temperature in a range of 20° C. or more and 100° C. or less, wherein the overcoat layer is an outermost layer of the gas barrier film, wherein the thermoplastic resin comprises a polyol having a hydroxyl value of 10 mg KOH/g or more and 250 mg KOH/g or less, wherein the overcoat layer has a Martens hardness from 10 N/mm2 to 90 N/mm2, wherein the barrier layer consists of titanium oxide or silicon oxide, and wherein the overcoat layer has a thickness in a range of 0.1 μm or more and 3.0 μm or less.
1 more element
Dependencies are inferred from the claim text.