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US 12,577,199 B2Granted
Method of manufacturing fluorine-containing compound
AssigneeAGC Inc.
InventorRyuta Takashita
Life of this patent
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Abstract
The present invention is directed to providing a method of manufacturing a fluorine-containing compound according to which a fluorine-containing compound is manufactured under a relatively moderate reaction condition by use of a readily available compound. A method of manufacturing a fluorine-containing compound includes reacting a compound having a partial structure expressed by a formula (a) below with a Grignard reagent in the presence of a transition metal compound, —CF2—CH2-L (a) wherein L is a sulfonate group.
Claims6
A method of manufacturing a fluorine-containing compound, comprising:
- reacting a compound of Formula (A1) or Formula (A2), with a Grignard reagent of Formula (B), in the presence of a transition metal compound, and
- obtaining a fluorine-containing compound of a formula G1-CF2—CH2—R if the starting material is of Formula (A1), or
- obtaining a fluorine-containing compound of a formula R—CH2(—CF2-G2)n-CF2—CH2—R if the starting material is of Formula (A2),
- G1-CF2—CH2-L Formula (A1)
- L-CH2(—CF2-G2)n-CF2—CH2-L Formula (A2)
- R—MgX Formula (B)
- wherein
- G1 is a monovalent group having a (poly)oxyfluoroalkylene chain, a hydrogen atom, an alkyl group, or a fluoroalkyl group,
- G2 is a divalent group having a (poly)oxyfluoroalkylene chain, a single bond, an alkylene group, or a fluoroalkylene group,
- L is a sulfonate group, and a plurality of L's in the formula (A2) may be identical to or different from each other,
- R is a hydrocarbon group optionally including a substituent and/or a heteroatom within a carbon chain,
- X is a halogen atom, and
- n is 0 or 1.
10 more elements
Dependencies are inferred from the claim text.