Devices and methods for gas purification treatment
AssigneeHarbin Institute of Technology, Shenzhen
InventorsRongshu Zhu, Qitong Zhao, Manyu Zhu
Life of this patent
Estimating the term…
Loading patent…
AssigneeHarbin Institute of Technology, Shenzhen
InventorsRongshu Zhu, Qitong Zhao, Manyu Zhu
Estimating the term…
A device for gas purification treatment may include: a light oxidation reactor, a light source being disposed in the light oxidation reactor, the light source being configured to emit first light and second light, the light oxidation reactor being configured to perform a first-stage purification treatment on a gas under irradiation of the first light; a catalytic ozone oxidation reactor configured for second-stage purification treatment of the gas; a photocatalytic reactor configured to perform a third-stage purification treatment on the gas under irradiation of the second light; wherein, the photocatalytic reactor is adjacent to the light oxide reactor, and the photocatalytic reactor and the light oxide reactor are separated by a light transmittance component, so that the second light passes through the light transmittance component into the photocatalytic reactor.
A device for gas purification treatment, wherein the device comprises:
A method for gas purification treatment performed using a device for gas purification treatment, the device including:
Dependencies are inferred from the claim text.