Cranial implant with wire management structure

A low-profile cranial device adapted for covering and protecting electrical leads, comprising:

• a static cranial implant shaped and dimensioned for housing a functional neurosurgical implant including electrical leads, the static cranial implant includes an outer first surface along an exterior side of the static cranial implant, an inner second surface along an interior side of the static cranial implant, and a peripheral wall extending between the outer first surface and the inner second surface;
• and
• a cavity formed along the outer first surface of the static cranial implant, the cavity being shaped and dimensioned to house the functional neurosurgical implant in a manner allowing the electrical leads to be wound up to store excess electrical lead length;
• wherein the cavity is defined by a circular base and a circumferential interior wall formed along the outer first surface of the static cranial implant, and the circumferential interior wall extends upwardly from the base to the exterior of the outer first surface of the static cranial implant to a point where it meets the outer first surface, and an annular upstanding wall is formed internally of the circumferential interior wall, the annular upstanding wall extending upwardly from the base to a height slightly lower than that of the circumferential interior wall.