Exposure system, exposure method, and electronic device manufacturing method

An exposure system comprising:

• a processor configured to
• read data indicating a relation between parameters and a wavelength difference between a first pulse laser beam and a second pulse laser beam, the parameters being related to exposure conditions under which a semiconductor wafer is exposed to a plurality of pulse laser beams including the first pulse laser beam and the second pulse laser beam,
• determine a target value of the wavelength difference based on the data and command values of the parameters,
• determine a first wavelength of the first pulse laser beam and a second wavelength of the second pulse laser beam based on the target value of the wavelength difference, and
• output a wavelength setting signal to a laser apparatus to cause emission of the pulse laser beams including the first pulse laser beam having the first wavelength and the second pulse laser beam having the second wavelength;
• and
• an optical system configured to expose the semiconductor wafer to the pulse laser beams.

An electronic device manufacturing method comprising:

• reading data indicating a relation between parameters and a wavelength difference between a first pulse laser beam and a second pulse laser beam, the parameters being related to exposure conditions under which a semiconductor wafer is exposed to a plurality of pulse laser beams including the first pulse laser beam and the second pulse laser beam;
• determining a target value of the wavelength difference based on the data and command values of the parameters;
• determining a first wavelength of the first pulse laser beam and a second wavelength of the second pulse laser beam based on the target value of the wavelength difference;
• outputting a wavelength setting signal to a laser apparatus to cause emission of the pulse laser beams including the first pulse laser beam having the first wavelength and the second pulse laser beam having the second wavelength to an exposure apparatus;
• and
• exposing the semiconductor wafer to the pulse laser beams in the exposure apparatus to manufacture an electronic device.