Optical devices and methods for manufacturing the optical devices
AssigneeII-Vi Delaware, Inc.
InventorsChristoph M. Greiner, Dmitri Iazikov
Life of this patent
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Abstract
An optical device is fabricated with a higher resolution of features in a patterned lattice. A photoresist is applied to a device layer for the optical device. Several photomasks offset from one another are used in different exposure steps to expose the photoresist with features. The features in each exposure can have different characteristic dimensions, such as different diameters for posts or holes to be produced in the device layer. Once the exposures are complete, the patterned lattice of the features are produced in the device layer. For example, the photoresist is developed, and reactive ion etching is used to produce the features in the device layer.
Claims9
A method of fabricating an optical device, the method comprising:
- applying a resist layer to a device layer for the optical device;
- producing a set of first features in the resist layer using a first mask, the first features arranged in a period in a patterned grid and having one or more first characteristic dimensions;
- producing at least one set of additional features in the patterned grid in the resist layer using at least one additional mask offset at a fraction of the period in at least one planar dimension from the first features, the additional features having one or more additional characteristic dimensions;
- and
- producing the patterned grid of the first features and the additional features in the device layer,
- wherein the patterned grid comprises a triangular grid;
- and wherein producing the at least one set of the additional features in the patterned grid in the resist layer using the at least one additional mask offset at the fraction of the period in the at least one planar dimension from the first features comprises:
- producing three sets of the additional features for the triangular grid in the resist layer using three of the at least one additional mask, each of the three additional masks offset at the fraction of the period in one of three of the planar dimensions from the first features.
Dependencies are inferred from the claim text.