Chemical liquid, resist pattern forming method, semiconductor chip manufacturing method, chemical liquid storage body, and chemical liquid manufacturing method

A chemical liquid to be used as a prewet solution, comprising:

• cyclohexanone;
• and
• one or more kinds of first compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3),
• wherein a content of the cyclohexanone is 98.000% to 99.999% by mass with respect to a total mass of the chemical liquid, and
• a total content of the first compounds is 0.001 to 100 ppm by mass with respect to the total mass of the chemical liquid
• wherein a mass ratio of a content of the compound represented by General Formula (1) to a content of the compound represented by General Formula (2) is 1 to 500, a mass ratio of a content of the compound represented by General Formula (1) to a content of the compound represented by General Formula (3) is 1 to 3,000, and a mass ratio of a content of the compound represented by General Formula (2) to a content of the compound represented by General Formula (3) is 1 to 150, and
• wherein the chemical liquid is obtained by subjecting a cyclohexanone raw material to a distillation and purification treatment, wherein the distillation and purification treatment includes performing distillation using a distillation column to obtain a distilled product, and then performing a first filtering of the distilled product by passing through a first filter, a second filter, a third filer, and a fourth filter each made of different materials, and then performing a second filtering by passing through at least a fifth filter and a sixth filter, wherein pore sizes of the fifth filter and the sixth filter are smaller than a pore size of the first filter, the second filter, the third filter, and the fourth filter in the first filtering.