Light irradiation type heat treatment method and heat treatment apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorsRyuta Tobe, Takahiro Kitazawa
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AssigneeSCREEN Holdings Co., Ltd.
InventorsRyuta Tobe, Takahiro Kitazawa
Estimating the term…
An upper radiation thermometer is provided obliquely above a semiconductor wafer to be measured. The upper radiation thermometer includes a photovoltaic detector that produces an electromotive force when receiving light. The photovoltaic detector has both high-speed responsivity and good noise properties in a low-frequency range. The upper radiation thermometer does not require a mechanism for cooling because the photovoltaic detector is capable of obtaining sufficient sensitivity at room temperature without being cooled. There is no need to provide a light chopper and a differentiating circuit in the upper radiation thermometer. This allows the upper radiation thermometer to measure the front surface temperature of the semiconductor wafer with a simple configuration both during preheating by means of halogen lamps and during flash irradiation.
A heat treatment apparatus for irradiating a substrate with a flash of light to heat the substrate, comprising:
A heat treatment apparatus for irradiating a substrate with a flash of light to heat the substrate, comprising:
A heat treatment apparatus for irradiating a substrate with a flash of light to heat the substrate, comprising:
Dependencies are inferred from the claim text.