Source gas supply method, source gas supply mechanism, and film forming system
AssigneeTokyo Electron Limited
InventorsTomoyuki Gomi, Masayuki Moroi, Yuichi Furuya, Kohichi Satoh
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsTomoyuki Gomi, Masayuki Moroi, Yuichi Furuya, Kohichi Satoh
Estimating the term…
A source gas supply method for supplying a source gas to a processing part through a line by a carrier gas is provided. The source gas is generated by vaporizing a film forming source by heating a source container in which the film forming source is stored and a filling gas is filled. The method comprises replacing the filling gas in the source container with a replacement gas that does not deteriorate the source gas, determining whether or not the replacement with the replacement gas has been performed by measuring a pressure in the line using a pressure gauge, and heating the source container and supplying the source gas when it is determined that the replacement with the replacement gas has been performed.
A source gas supply method for supplying a source gas to a processing part through a line by a carrier gas, the source gas being generated by vaporizing a film forming source by heating a source container in which the film forming source is stored and a filling gas is filled, the method comprising:
A source gas supply method for supplying a source gas to a processing part through a line by a carrier gas, the source gas being generated by vaporizing a film forming source by heating a source container in which the film forming source is stored and a filling gas is filled, the method comprising:
A source gas supply method for supplying a source gas to a processing part through a line by a carrier gas, the source gas being generated by vaporizing a film forming source by heating a source container in which the film forming source is stored and a filling gas is filled, the method comprising:
A source gas supply method for supplying a source gas to a processing part through a line by a carrier gas, the source gas being generated by vaporizing a film forming source by heating a source container in which the film forming source is stored and a filling gas is filled, the method comprising:
A source gas supply mechanism for supplying a source gas to a processing part by a carrier gas, the source gas being generated by vaporizing a film forming source, comprising:
A source gas supply mechanism for supplying a source gas to a processing part by a carrier gas, the source gas being generated by vaporizing a film forming source, comprising:
A source gas supply mechanism for supplying a source gas to a processing part by a carrier gas, the source gas being generated by vaporizing a film forming source, comprising:
A film forming system comprising:
Dependencies are inferred from the claim text.