Composition for semiconductor processing and processing method
AssigneeJsr Corporation
InventorHiroyuki Tano
Life of this patent
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Abstract
A composition for semiconductor processing according to the disclosure contains (A) a compound represented by the following general formula (1), (B) a compound represented by the following general formula (2), (C) a compound having at least one functional group selected from the group consisting of an amino group and a salt thereof (excluding a compound having a carboxyl group and a nitrogen-containing heterocyclic compound) and (D) a liquid medium, and, when the content of the (A) component is indicated by MA [mass %] and the content of the (B) component is indicated by MB [mass %], MA/MB is 1.0×102 to 1.0×106. RO(CH2)2O(CH2)2OH (1) ROH (2) (In the formula (1) and the formula (2), R's represent the same hydrocarbon group.)
Claims12
A composition for semiconductor processing comprising:
- (A) a compound represented by the following general formula (1);
- (B) a compound represented by the following general formula (2);
- (C) a compound having at least one functional group selected from the group consisting of an amino group and a salt thereof, excluding a compound having a carboxyl group and a nitrogen-containing heterocyclic compound;
- and
- (D) a liquid medium,
- wherein, a content of the (A) component is indicated by MA [mass %] and a content of the (B) component is indicated by MB [mass %], and MA/MB is 1.0×102 to 1.0×106,
- RO(CH2)2O(CH2)2OH (1)
- ROH (2)
- and
- in the formula (1) and the formula (2), each R represents the same hydrocarbon group which is an alkyl group having from 1 to 4 carbon atoms.
Dependencies are inferred from the claim text.