Method for texturing a polyamide

A method for preparing an object comprising at least one film comprising at least one layer (1) comprising a composition comprising at least one semi-crystalline polyamide (Psc) having a melt enthalpy of between 25 J/g and 75 J/g during a first Differential Scanning Calorimetry (DSC) heating according to ISO 11357-3:2013 at 40° C./min, the film having on all or part of at least one of its surfaces a texture of a texturing element,

• wherein the method comprises the following steps:
• a. providing a mold set to a temperature less than or equal to 120° C.,
• b. applying to a wall of the mold, the texturing element having at least partially a textured surface, the textured surface being on a face of the texturing element opposite to a face facing the wall of the mold,
• c. applying to the textured surface of the texturing element, the at least one film comprising at least one layer (1) comprising the composition comprising at least one semi-crystalline polyamide (Psc), the layer (1) being intended for being in contact with the textured surface of the texturing element, a thickness of the layer (1) being at least 10 μm,
• d. applying at least one heating means to the film of step (c), in order to arrive at a temperature on a face of the film facing the texturing element, between a glass transition temperature (Tg) and a melting temperature (Tm) of the composition minus 15° C., the melting temperature (Tm) being measured according to ISO 11357-3:2013, and applying a pressure means to the film in order to bring it into contact with the texturing element, with a pressure between 1.5 and 2000 bars, for a time t between 0.1 seconds and 5 hours,
• e. removing the film from the mold and obtaining the object comprising the film comprising the composition comprising at least semi-crystalline polyamide and having on all or part of at least one of its surfaces the texture of the texturing element,
• wherein the method comprises, during step d., maintaining the temperature on the face of the film facing the texturing element below the melting temperature (Tm) of the composition minus 15° C.