Arrays of capacitors, methods used in forming integrated circuitry, and methods used in forming an array of capacitors
OwnerScott L. Lightinventor
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Abstract
A method used in forming integrated circuitry comprises forming an array of structures elevationally through a stack comprising first and second materials. The structures project vertically relative to an outermost portion of the first material. Energy is directed onto vertically-projecting portions of the structures and onto the second material in a direction that is angled from vertical and that is along a straight line between immediately-adjacent of the structures to form openings into the second material that are individually between the immediately-adjacent structures along the straight line. Other embodiments, including structure independent of method, are disclosed.
Claims8
An array of capacitors comprising:
- a two-dimensional (2D) array of vertically-elongated first capacitor electrodes;
- an uppermost horizontal layer of insulative support material directly against and supporting the first capacitor electrodes;
- openings extending vertically through the uppermost horizontal layer of the insulative support material in the 2D array, the openings having total number within the array that equals total number of the vertically-elongated first capacitor electrodes in the 2D array;
- a capacitor insulator directly against the uppermost horizontal layer of the insulative support material and directly against the vertically-elongated first capacitor electrodes;
- and
- at least one second capacitor electrode directly against the capacitor insulator.
Dependencies are inferred from the claim text.