Multiplexed hologram interference exposure system

An apparatus for fabricating hologram devices, comprising:

• a support table comprising a plurality of process chambers;
• a laser configured to direct a beam along a propagation path to each of the plurality of process chambers;
• a central mirror disposed in a center region of the support table, the plurality of process chambers surrounding the center region of the support table;
• a beam converting optic configured to receive a beam from the laser and emit the beam to the central mirror, the beam converting optic configured to receive the beam comprising a first intensity profile and to emit the beam comprising a second intensity profile, the central mirror configured to sequentially direct the beam from the laser to each of the plurality of process chambers;
• a beam splitter disposed on each of the plurality of process chambers, the beam splitter configured to receive the laser from the central mirror and emit a first beam in a first direction and a second beam in a second direction;
• and
• a first mirror configured to direct the first beam to an optical target;
• and a second mirror configured to direct the second beam to the optical target, wherein the first and second mirror is rotatable along three axes.

A method for fabricating hologram devices, comprising:

• directing a beam from a laser to a central mirror, the central mirror disposed in a central region of a support table, the support table comprising a plurality of process chambers surrounding the central mirror;
• directing the beam from the central mirror to a first chamber of the plurality of process chambers disposed on the support table;
• expanding the beam from the central mirror in a beam expander disposed in the first chamber;
• splitting the beam from the beam expander with a beam splitter disposed in each of the plurality of process chambers, the beam splitter configured to receive the laser from the central mirror and emit a first beam in a first direction and a second beam in a second direction;
• and
• directing the first beam from the beam splitter to a first mirror and to a device;
• directing the second beam from the beam splitter to a second mirror and to the device, wherein the first and second mirrors are rotatable along three axes;
• and
• simultaneously exposing a first side of a device to the first beam and a second side of the device to the second beam.