Film formation method
AssigneeFlosfia Inc.
InventorsMakoto Shimizu, Hiroshi Shiho, Hiroyuki Ando, Naoyuki Tsukamoto, Yuji Kato
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Abstract
A film formation method having an excellent mass productivity, whereby a time required for forming a film having a desired thickness is short. In the film formation method, at least one of a metal complex having two or more different ligands, and a metal complex having same ligands and substituents is used, and the method includes atomizing or dropletizing a liquid containing the metal complex, conveying resulting mist or droplets to a base by a carrier gas, and forming a metal oxide film on the base by thermally reacting the mist or droplets in the vicinity of the base.
Claims12
A film formation method, the method comprising steps of:
- atomizing or dropletizing a liquid containing a metal complex, the metal complex being at least one of:
- a metal complex having two or more different ligands, and
- a metal complex having same ligands and substituents;
- conveying a resulting mist or droplets to a base by a carrier gas;
- and
- forming a metal oxide film on the base by thermally reacting the mist or droplets in the vicinity of the base, wherein
- the two or more different ligands include at least one ligand represented by following formula (1) and at least one ligand selected from a group consisting of a ligand derived from acetylacetonato, a ligand having a heterocyclic structure, and the ligand represented by following formula (1), and
- in following formula (1), the dotted line represents a coordinate bond, *1 represents a coordinate bond position with a metal, *2 represents a bond position with a metal, and each of R1 and R2 independently represents an alkyl group having 1 to 6 carbon atoms,
- the metal complex having the same ligands and substituents is represented by following formula (2), and
- in following formula (2), the dotted line represents a coordinate bond, each of R3 and R4 independently represents hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a phenyl group, or a tolyl group, R5 represents a halogen atom, a formyl group, an acetoxy group, a sulfo group, a mesyl group, a nitro group, a nitroso group, a phosphoryl group, or an alkyl group having 1 to 6 carbon atoms, and X represents a central metal
A film formation method, the method comprising a step of forming a metal oxide film on a base by applying a liquid containing a metal complex on the base, followed by drying, wherein
- the metal complex is at least one of:
- a metal complex having two or more different ligands, and
- a metal complex having same ligands and substituents,
- the two or more different ligands include at least one ligand represented by following formula (1) and at least one ligand selected from a group consisting of a ligand derived from acetylacetonato, a ligand having a heterocyclic structure, and the ligand represented by following formula (1), and
- in following formula (1), the dotted line represents a coordinate bond, *1 represents a coordinate bond position with a metal, *2 represents a bond position with a metal, and each of R1 and R2 independently represents an alkyl group having 1 to 6 carbon atoms,
- the metal complex having the same ligands and substituents is represented by following formula (2), and
- in following formula (2), the dotted line represents a coordinate bond, each of R3 and R4 independently represents hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a phenyl group, or a tolyl group, R′ represents a halogen atom, a formyl group, an acetoxy group, a sulfo group, a mesyl group, a nitro group, a nitroso group, a phosphoryl group, or an alkyl group having 1 to 6 carbon atoms, and X represents a central metal
Dependencies are inferred from the claim text.