Gas feed device, system having a gas feed device, and particle beam apparatus having a gas feed device or the system

A system, comprising:

• a gas feed device that includes at least one feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor onto an object, at least one first line device that conducts the gaseous state of the first precursor to the feed unit, at least one second line device that conducts the gaseous state of the second precursor to the feed unit, at least one first valve that controls the inflow of the gaseous state of the first precursor, the first valve being arranged between the first line device and the feed unit;
• at least one second valve that controls the inflow of the gaseous state of the second precursor, the second valve being arranged between the second line device and the feed unit, and at least one control valve that controls the inflow of the gaseous state of the first precursor and/or the gaseous state of the second precursor to the feed unit, wherein the control valve is connected to the first valve by a third line device, the control valve is arranged between the first valve and the feed unit, the control valve is connected to the second valve by a fourth line device, the control valve is arranged between the second valve and the feed unit, the control valve is connected to the feed unit for the feed of the gaseous state of the first precursor and/or the gaseous state of the second precursor via a line, and wherein at least one of the first valve, the second valve, and/or the control valve is a magnetic valve;
• and
• a gas feed unit that includes a first precursor reservoir and a second precursor reservoir.

A particle beam apparatus for imaging, analyzing and/or processing an object, comprising

• at least one beam generator that generates a particle beam with charged particles;
• at least one objective lens that focuses the particle beam onto the object;
• at least one sample chamber that arranges the object in the particle beam apparatus;
• at least one detector that detects interaction particles and/or interaction radiation arising during an interaction of the particle beam with the object;
• and
• at least one gas feed device that includes at least one feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor onto an object, at least one first line device that conducts the gaseous state of the first precursor to the feed unit, at least one second line device that conducts the gaseous state of the second precursor to the feed unit, at least one first valve that controls the inflow of the gaseous state of the first precursor, the first valve being arranged between the first line device and the feed unit;
• at least one second valve that controls the inflow of the gaseous state of the second precursor, the second valve being arranged between the second line device and the feed unit, and at least one control valve that controls the inflow of the gaseous state of the first precursor and/or the gaseous state of the second precursor to the feed unit, wherein the control valve is connected to the first valve by a third line device, the control valve is arranged between the first valve and the feed unit, the control valve is connected to the second valve by a fourth line device, the control valve is arranged between the second valve and the feed unit, the control valve is connected to the feed unit for the feed of the gaseous state of the first precursor and/or the gaseous state of the second precursor via a line, and wherein at least one of the first valve, the second valve, and/or the control valve is a magnetic valve or a system that includes at least one feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor onto an object, at least one first line device that conducts the gaseous state of the first precursor to the feed unit, at least one second line device that conducts the gaseous state of the second precursor to the feed unit, at least one first valve that controls the inflow of the gaseous state of the first precursor, the first valve being arranged between the first line device and the feed unit, at least one second valve that controls the inflow of the gaseous state of the second precursor, the second valve being arranged between the second line device and the feed unit, and at least one control valve that controls the inflow of the gaseous state of the first precursor and/or the gaseous state of the second precursor to the feed unit, wherein the control valve is connected to the first valve by a third line device, the control valve is arranged between the first valve and the feed unit, the control valve is connected to the second valve by a fourth line device, the control valve is arranged between the second valve and the feed unit, the control valve is connected to the feed unit for the feed of the gaseous state of the first precursor and/or the gaseous state of the second precursor via a line, and wherein at least one of the first valve, the second valve, and/or the control valve is a magnetic valve, and a gas feed unit that includes a first precursor reservoir and a second precursor reservoir.