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US 12,559,704 B2Granted
Microelectronic device cleaning composition
AssigneeEntegris, Inc.
InventorsElizabeth Thomas, Michael L. White, Atanu K. Das, Daniela White, YoungMin Kim, Jun Liu
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Abstract
A composition for cleaning a microelectronic device substrate is provided. The composition is useful for cleaning in-process microelectronic device substrates possessing exposed cobalt, molybdenum, copper, molybdenum, tungsten, and dielectric surfaces. Also provided is a method for cleaning such devices and a kit comprising one or more of the components of the composition.
Claims16
A composition comprising:
- water;
- a complexing agent;
- and
- an amino(C6-C12 alkyl)alcohol;
- wherein said composition is devoid of a guanidine functional compound, a pyrazolone functional compound, and a hydroxyquinoline compound, and wherein the pH of the composition is between about 1.5 and 6.
2 more elements
Dependencies are inferred from the claim text.