Substrate processing method and sublimation drying processing agent

A substrate processing method, comprising:

• supplying a processing liquid in which a sublimation drying processing agent is liquefied, onto a front surface of a substrate on which a pattern is formed, to thereby form a liquid film of the processing liquid on the front surface of the substrate, the sublimation drying processing agent being a mixture of a first sublimable substance and a second sublimable substance which differ from each other in a eutectic composition or a near-eutectic composition;
• solidifying the liquid film of the processing liquid, to thereby form a solidified film of the sublimation drying processing agent;
• and
• sublimating the solidified film, to thereby remove the solidified film from the front surface of the substrate, wherein
• the first sublimable substance is camphor,
• the second sublimable substance is cyclohexanone oxime, and
• the weight percentage of the second sublimable substance in the sublimation drying processing agent is in a range of from equal to or greater than the weight percentage at the eutectic composition and 60% or less.