Micro-roughened electrodeposited copper foil and copper clad laminate
AssigneeCo-Tech Development Corp.
InventorsYun-Hsing Sung, Shih-Shen Lee, Hung-Wei Hsu, Chun-Yu Kao
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Abstract
Provided is a micro-roughened electrodeposited copper foil, which comprises a micro-rough surface and multiple copper nodules. The micro-roughened electrodeposited copper foil has an Sdr of 0.01 to 0.08. With the surface characteristics, the electron path distance can be shortened, such that the micro-roughened electrodeposited copper foil can reduce the insertion loss of the copper clad laminate at high frequencies and have the desired peel strength.
Claims12
A micro-roughened electrodeposited copper foil comprising a micro-rough surface, wherein the micro-rough surface has an Sdr value of 0.0153 to 0.0493.
The micro-roughened electrodeposited copper foil comprising a micro-rough surface, wherein the micro-rough surface has the Sdr value of 0.0153 to 0.023.
Dependencies are inferred from the claim text.