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US 12,557,204 B2Granted
Nozzle and substrate treating apparatus including the same
AssigneeSemes Co., Ltd.
InventorsSunmi Kim, Kyu Hwan Chang
Life of this patent
Estimating the term…
Abstract
An apparatus for treating a substrate includes a support unit that supports the substrate and a nozzle that dispenses liquid plasma to etch a film formed on the substrate supported on the support unit.
Claims18
A nozzle for dispensing liquid plasma to etch a film formed on a substrate, the nozzle comprising:
- a body having an inner space and an exterior wall defining the inner space;
- a liquid supply unit configured to supply a liquid into the inner space;
- a gas supply unit configured to supply an etching gas into the inner space;
- and
- a plurality of electrodes, wherein each electrode is configured to generate plasma in the inner space,
- wherein the nozzle further includes an insulating part having a container shape open at a top of the nozzle, and the insulating part is inserted into the inner space through an opening formed in the body,
- wherein the plurality of electrodes includes:
- a first electrode;
- and
- a second electrode disposed on and surrounding the exterior wall of the body,
- wherein the first electrode is inserted into the insulating part and fixed in the insulating part, and the second electrode is movable on the exterior wall along a lengthwise direction of the nozzle and a lengthwise direction of the first electrode,
- wherein the body has a liquid inlet port through which the liquid supplied by the liquid supply unit is introduced into the inner space of the body, and
- wherein the liquid inlet port is provided such that the liquid introduced into the inner space through the liquid inlet port collides with an inner wall of the body to bubble in the inner space.
10 more elements
An apparatus for treating a substrate, the apparatus comprising:
- a support unit configured to support the substrate;
- and
- a nozzle configured to dispense liquid plasma to etch a film formed on the substrate supported on the support unit,
- wherein the nozzle includes:
- a body having an inner space and an exterior wall defining the inner space;
- a first electrode;
- and
- a second electrode disposed on and surrounding the exterior wall of the body,
- an insulating part having a container shape open at a top of the nozzle and inserted into the inner space through an opening formed in the body,
- wherein the first electrode is inserted into the insulating part and fixed in the insulating part, and the second electrode is movable on the exterior wall along a lengthwise direction of the nozzle and a lengthwise direction of the first electrode,
- wherein the body has a liquid inlet port through which the liquid plasma supplied by a liquid supply unit is introduced into the inner space of the body, and
- wherein the liquid inlet port is provided such that the liquid plasma introduced into the inner space through the liquid inlet port collides with an inner wall of the body to bubble in the inner space.
9 more elements
An apparatus for treating a substrate, the apparatus comprising:
- a housing having a treatment space;
- a support unit configured to support the substrate in the treatment space;
- and
- a liquid dispensing unit configured to dispense a treatment liquid containing plasma onto the substrate supported on the support unit,
- wherein the liquid dispensing unit includes:
- a nozzle configured to dispense the treatment liquid;
- and
- a moving member configured to move the nozzle, and
- wherein the nozzle includes:
- a body having an inner space and an exterior wall defining the inner space;
- a liquid supply unit configured to supply the treatment liquid in a bubbling state into the inner space or cause the treatment liquid to bubble in the inner space;
- a gas supply unit configured to supply an etching gas into the inner space;
- and
- a plurality of electrodes, wherein each electrode is configured to generate plasma in the inner space,
- an insulating part having a container shape open at a top of the nozzle and inserted into the inner space through an opening formed in the body,
- wherein the plurality of electrodes includes:
- a first electrode;
- and
- a second electrode disposed on and surrounding the exterior wall of the body,
- wherein the first electrode is inserted into the insulating part and fixed in the insulating part, and the second electrode is movable on the exterior wall along a lengthwise direction of the nozzle and a lengthwise direction of the first electrode,
- wherein the body has a liquid inlet port through which the treatment liquid supplied by the liquid supply unit is introduced into the inner space of the body, and
- wherein the liquid inlet port is provided such that the treatment liquid introduced into the inner space through the liquid inlet port collides with an inner wall of the body to bubble in the inner space.
19 more elements
Dependencies are inferred from the claim text.