Batch type substrate processing apparatus

A batch type substrate processing apparatus comprising:

• a reaction tube configured to provide a processing space in which a plurality of substrates are accommodated;
• a plurality of electrodes extending in a longitudinal direction of the reaction tube and disposed along a circumferential direction of the reaction tube;
• and
• an electrode protection part configured to protect the plurality of electrodes,
• wherein the plurality of electrodes comprise:
• first and second power supply electrodes spaced apart from each other;
• and
• first and second ground electrodes provided between the first power supply electrode and the second power supply electrode to correspond to the first power supply electrode and the second power supply electrode, respectively, and
• the electrode protection part comprises:
• a plurality of first electrode protection tubes, each of which has a closed upper end and an opened lower end, and which have inner spaces in which the first and second power supply electrodes are inserted, respectively;
• a plurality of second electrode protection tubes, each of which has a closed upper end and an opened lower end, and which have inner spaces in which the first and second ground electrodes are inserted, respectively;
• and
• a plurality of bridge parts configured to connect upper ends of the first electrode protection tube and the second electrode protection tube, which face each other, to each other, respectively,
• wherein the first ground electrode is spaced apart from the first power supply electrode,
• the second ground electrode is spaced apart from the second power supply electrode,
• the first and second ground electrodes are spaced apart from each other, and
• a spaced distance between the first and second ground electrodes is less than or equal to each of a spaced distance between the first power supply electrode and the first ground electrode and a spaced distance between the second power supply electrode and the second ground electrode.