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US 12,553,137 B2Granted
Coated cutting tool
AssigneeWalter AG
InventorsWolfgang Engelhart, Veit Schier, Sven Majchrzak
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Abstract
A coated cutting tool and a process for the production thereof is provided. The coated cutting tool consists of a substrate body of WC—Co based cemented carbide and a coating, the coating including a first (Ti,Al)N multilayer, a first gamma-aluminium oxide layer, and a set of alternating second (Ti,Al)N multilayers and second gamma-aluminium oxide layers.
Claims19
A coated cutting tool consisting of:
- a substrate body having a surface;
- and
- a coating, the substrate body being a WC—Co based cemented carbide body 5-15 wt % Co, and the coating comprising, in the order from the substrate body surface:
- a first (Ti,Al)N multilayer consisting of a multilayer of individual alternating (Ti,Al)N sub-layers, wherein an overall atomic ratio of Ti:Al within the first (Ti,Al)N multilayer is from 33:67 to 67:33, wherein a total thickness of the first (Ti,Al)N multilayer is from 1 to 8 μm, wherein each of the individual (Ti,Al)N sub-layers within the first (Ti,Al)N multilayer has a thickness of from 1 to 25 nm, wherein each of the individual (Ti,Al)N sub-layers within the first (Ti,Al)N multilayer being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer, and wherein the first (Ti,Al)N multilayer consists of two or more (Ti,Al)N sub-layer stacks arranged immediately on top of each other, wherein within the same (Ti,Al)N sub-layer stack there exists at least two types of individual (Ti,Al)N sub-layers, wherein the at least two types of individual (Ti,Al)N sub-layers have different Ti:Al atomic ratios, and wherein the overall Al content within each of the (Ti,Al)N sub-layer stacks increases from one (Ti,Al)N sub-layer stack to the next (Ti,Al)N sub-layer stack in the direction towards the outer surface of the coating;
- a first gamma-aluminium oxide layer, wherein a thickness of the first gamma-aluminium oxide layer is from 0.3 to 1.5 μm;
- and
- a set of alternating second (Ti,Al)N multilayers and second gamma-aluminium oxide layers, wherein a number of each of the alternating second (Ti,Al)N multilayers and second gamma-aluminium oxide layers is ≥2, each of the second (Ti,Al)N multilayers being a multilayer of alternating (Ti,Al)N sub-layers, wherein an overall atomic ratio of Ti:Al within the second (Ti,Al)N multilayers is within the range from 33:67 to 67:33, wherein a thickness of each of the second (Ti,Al)N multilayers is from 0.05 to 0.5 μm, wherein each of the individual (Ti,Al)N sub-layers within the second (Ti,Al)N multilayers has a thickness within the range from 1 to 25 nm, each of the individual (Ti,Al)N sub-layers within the second (Ti,Al)N multilayers being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer, wherein a thickness of each of the second gamma-aluminium oxide layers is from 0.05 to 0.5 μm, and wherein a total thickness of the coating of the coated cutting tool is from 3 to 15 μm.
4 more elements
A process for the production of a coated cutting tool consisting of a substrate body and a deposited coating, comprising the steps of:
- providing a substrate body, the substrate body being a WC—Co based cemented carbide body including from 5 to 15 wt % Co;
- subjecting a surface of the substrate body to a pre-treatment, the pre-treatment being an ion etching procedure, so that at least a 0.5 μm thickness of the substrate body is removed;
- depositing a 1 to 8 μm thick layer of a first TiAlN multilayer by a cathodic arc evaporation PVD process using at least two TiAl targets different in a Ti:Al atomic ratio in a chamber including nitrogen gas at a pressure of from 5 to 15 Pa, using a bias voltage of from −20 to −80 V, and at an applied arc current of from 50 to 200 A, the (Ti,Al)N multilayer consisting of a multilayer of alternating (Ti,Al)N sub-layers, wherein the atomic Ti:Al ratio of the at least two TiAl targets is chosen so that an overall atomic ratio of Ti:Al is from 33:67 to 67:33, wherein each of the individual (Ti,Al)N sub-layers has a thickness within the range from 1 to 25 nm, each of the individual (Ti,Al)N sub-layers being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer, wherein the (Ti,Al)N multilayer is deposited in a manner so that it consists of two or more (Ti,Al)N sub-layer stacks arranged immediately on top of each other, wherein within the same (Ti,Al)N sub-layer stack there exists at least two types of individual (Ti,Al)N sub-layers, wherein the at least two types of individual (Ti,Al)N sub-layers have different Ti:Al atomic ratios, and wherein the overall Al content within each of the (Ti,Al)N sub-layer stacks increases from one (Ti,Al)N sub-layer stack to the next (Ti,Al)N sub-layer stack in the direction towards the outer surface of the first (Ti,Al)N multilayer;
- depositing a 0.3 to 1.5 μm thick layer of a first gamma-aluminium oxide layer by a reactive magnetron sputtering PVD process using at least one Al target in an oxygen containing gas volume at a total gas pressure of from 1 to 5 Pa, an oxygen partial pressure of from 0.001 to 0.1 Pa, at a temperature of from 400 to 600° C., using a power density at the magnetron of from 4 to 20 W/cm2, a bias voltage of from 80 to 200 V and a pulsed bias current of from 20 to 60 A;
- depositing a set of alternating layers of second (Ti,Al)N multilayers and second gamma-aluminium oxide layers, the second (Ti,Al)N multilayers and the second gamma-aluminium oxide layers are deposited using the same process conditions as when depositing the first (Ti,Al)N multilayer and the first gamma-aluminium oxide layer, respectively, wherein the number of each of second (Ti,Al)N multilayers and second gamma-aluminium oxide layers is ≥2, each of the second (Ti,Al)N multilayers being a multilayer of alternating (Ti,Al)N sub-layers, the overall atomic ratio of Ti:Al within the second (Ti,Al)N multilayers is from 33:67 to 67:33, the thickness of the second (Ti,Al)N multilayers is from 0.05 to 0.5 μm, each of the individual (Ti,Al)N sub-layers within the second (Ti,Al)N multilayers has a thickness of from 1 to 25 nm, each of the individual (Ti,Al)N sub-layers within the second (Ti,Al)N multilayers being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer, the thickness of the second gamma-aluminium oxide layers is from 0.05 to 0.5 μm, wherein a total thickness of the deposited coating of the coated cutting tool is from 3 to 15 μm;
- subjecting the deposited coating to a first post-treatment procedure including shot peening using beads of a zirconium oxide based ceramic so that a compressive stress of at least 0.5 GPa is induced in the surface zone of the substrate body;
- and
- subjecting the deposited coating to a second post-treatment procedure by wet blasting with a slurry of aluminium oxide particles.
5 more elements
Dependencies are inferred from the claim text.