Methods of forming epitaxial AlScN resonators with superlattice structures including AlGaN interlayers and varied scandium concentrations for stress control and related structures
AssigneeAkoustis Technologies Corp.
InventorsCraig Moe, Jeffrey M. Leathersich, Jeffrey B. Shealy
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Abstract
A method of forming a resonator structure can be provided by forming one or more template layers on a substrate, (a) epitaxially forming an AlScN layer on the template layer to a first thickness, (b) epitaxially forming an AlGaN interlayer on the AlScN layer to a second thickness that is substantially less than the first thickness, and repeating operations (a) and (b) until a total thickness of all AlScN layers and AlGaN interlayers provides a target thickness for a single crystal AlScN/AlGaN superlattice resonator structure on the template layer.
Claims16
A method of forming a resonator structure, the method comprising:
- forming one or more template layers on a substrate;
- (a) epitaxially forming an AlScN layer on the template layer to a first thickness;
- (b) epitaxially forming an AlGaN interlayer on the AlScN layer to a second thickness that is substantially less than the first thickness;
- and
- repeating operations (a) and (b) until a total thickness of all AlScN layers and AlGaN interlayers provides a target thickness for a single crystal AlScN/AlGaN superlattice resonator structure on the template layer.
A method of forming a resonator structure, the method comprising:
- forming a template layer on a substrate;
- epitaxially forming a first portion of a AlScN layer on the template layer with a first concentration of Sc therein;
- epitaxially forming a second portion of the AlScN layer on first portion with a second concentration of Sc therein that is greater than the first concentration;
- and
- epitaxially forming a top portion of the AlScN layer on second portion with a third concentration of Sc therein that is greater than the first and second concentrations.
Dependencies are inferred from the claim text.