Conductive film and manufacturing method of conductive film

A manufacturing method of a conductive film that includes a metal oxide as a main component, wherein

• the metal oxide has same components as components of a compound represented by a formula (I):
• (AO)2B6O11 (I)
• where A in the formula (I) is a metal element capable of having a valence of +1 or +2, B in the formula (I) is a transition metal element capable of having a valence of +4 or +5, O in the formula (I) is an oxygen element, and an average valence of B in the formula (I) is less than a maximum oxidation number of B, and
• the metal oxide has a crystal structure in which diffraction peaks in an X-ray diffraction pattern of the metal oxide appear at same diffraction angles as diffraction angles at which diffraction peaks in an X-ray diffraction pattern of the compound represented by the formula (I) appear,
• the manufacturing method comprising:
• preparing a base member;
• and
• forming the conductive film on a surface of the base member by a laser ablation method performed in an atmosphere containing oxygen gas and performed using a target containing a same element as A in the formula (I) and a same element as B in the formula (I).