Substrate processing apparatus and non-transitory computer readable medium

A substrate processing apparatus, comprising:

• a polishing unit, comprising at least one polishing device that performs a polishing process on a substrate;
• a cleaning unit, comprising at least one cleaning device that performs a cleaning process on the substrate polished by the polishing unit;
• a transport unit, comprising at least one transport device that performs a transport process on the substrate;
• and
• a control device, controlling the substrate processing apparatus,
• wherein the control device is configured to execute:
• a calculation control process, calculating patterns for changing an order of loading to the substrate processing apparatus for a plurality of substrates loaded to the substrate processing apparatus based on a processing recipe in which processing contents applied to each of the substrates loaded to the substrate processing apparatus are defined in advance;
• a time table generation control process, generating, for each of the patterns obtained in the calculation control process, a time table in which process end times in the polishing device, the cleaning device, and the transport device are associated, so that an idling state does not occur from a time when the substrates are loaded to the substrate processing apparatus until a cleaning process ends;
• a selection control process, selecting a time table with a shortest time from a time when a process of a substrate initially loaded to the substrate processing apparatus starts until a process of a substrate that is lastly loaded ends in the time tables obtained in the time table generation control process;
• and
• a timing control process, controlling timings of loading the substrates to the substrate processing apparatus based on the time table selected in the selection control process.